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Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/54959
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dc.contributor.authorBrooks, A.-
dc.contributor.authorHosken, D.-
dc.contributor.authorMunch, J.-
dc.contributor.authorVeitch, P.-
dc.contributor.authorYan, Z.-
dc.contributor.authorZhao, C.-
dc.contributor.authorFan, Y.-
dc.contributor.authorJu, L.-
dc.contributor.authorBlair, D.-
dc.contributor.authorWillems, P.-
dc.contributor.authorSlagmolen, B.-
dc.contributor.authorDegallaix, J.-
dc.date.issued2009-
dc.identifier.citationApplied Optics, 2009; 48(2):355-364-
dc.identifier.issn1559-128X-
dc.identifier.issn0003-6935-
dc.identifier.urihttp://hdl.handle.net/2440/54959-
dc.description.abstractWavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational wave interferometers has the potential to compromise the operation and sensitivity of these interferometers [Opt. Lett.29, 2635-2637 (2004)]. We report the first direct spatially-resolved measurement, to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of the sensor was lambda/730, where lambda=800 nm.-
dc.description.statementofresponsibilityAidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, and Jerome Degallaix-
dc.language.isoen-
dc.publisherOptical Society of America-
dc.rightsCopyright © 2009 Optical Society of America-
dc.source.urihttp://dx.doi.org/10.1364/ao.48.000355-
dc.titleDirect measurement of absorption-induced wavefront distortion in high optical power systems-
dc.typeJournal article-
dc.identifier.doi10.1364/AO.48.000355-
pubs.publication-statusPublished-
dc.identifier.orcidVeitch, P. [0000-0002-2597-435X]-
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